cvitae.org - Electron Beam Lithography

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Welcome to the Electron Beam Lithography Group at SNF

We have two electron beam lithography (EBL) tools for lithography and direct patterning: the Raith 150 and the Hitachi HL-700 F systems. The systems are housed in the Stanford Nanofabrication Facility (SNF), which also provides most tools for processing: resist development, dry and we etching, characterization tools, etc. The tool is administered by James Conway.

This website provides information on the following:

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Raith 150 test pattern.

Publications

last modified 2007-03-22 17:11:58

CVitae -

Research

E-beam Lithography Resist Processing

by Electron Beam Lithography

Thursday, 22 March 2007

General Recipe for EBL resist processing

Discusses the following positive and negative resists: PMMA, ZEP 520-12, APEX-E, SAL-601, SNR-200, UVN2, UVN30, UV5.

http://www.ui.savba.sk/ebl/Rieuvii1a.gif

by Dirk Englund

Thursday, 29 March 2007

Direct Analysis of Photonic Nanostructures:

Anyone working with photonic crystals, or any photonic nanostructures for that matter, knows that fabricated structures never come out as well as the simulated design. What's to blame? Material losses? Fabrication inaccuracies? In this articles, we analyze the optical properties of photonic nanostructures.